Tlačiť

Kyselina fosforečná ≥85%, CMOS for microelectronic, J.T.Baker®

Dodávateľ: Avantor
Nebezpečí

0274-11EA 0 EUR
0274-11 0274-AN
Kyselina fosforečná ≥85%, CMOS for microelectronic, J.T.Baker®
Kyselina fosforečná
Vzorec: H₃PO₄
Mw: 98 g/mol
Teplota tavenia: 28 °C
Hustota: 1,71 - 1.87 g/cm³ (25 °C)
Skladovacia teplota: Ambient
Číslo MDL: MFCD00011340
Číslo CAS: 7664-38-2
EINECS: 231-633-2
OSN: 1805
ADR: 8,III
Merck Index: 14,08596

Order Now

Výsledky špecifikačného testu

For Microelectronic Use
Store at temperatures above 22°C (72°F)
Assay (H₃PO₄) (by acidimetry) 85.0 - 87.0 %
Color (APHA) ≤10
Specific Gravity at 60°/60°F 1.691 - 1.710
Reducing Substances Passes Test
Volatile Acids (µeq/g) ≤0.16
Chloride (Cl) ≤1.0 ppm
Nitrate (NO₃) ≤2 ppm
Sulfate (SO₄) ≤12 ppm
Trace Impurities - Aluminum (Al) ≤0.500 ppm
Trace Impurities - Antimony (Sb) ≤10.000 ppm
Trace Impurities - Arsenic (As) ≤0.050 ppm
Trace Impurities - Calcium (Ca) ≤1.500 ppm
Trace Impurities - Chromium (Cr) ≤0.200 ppm
Trace Impurities - Cobalt (Co) ≤0.050 ppm
Trace Impurities - Copper (Cu) ≤0.050 ppm
Trace Impurities - Gold (Au) ≤0.300 ppm
Trace Impurities - ACS - Heavy Metals (as Pb) ≤5 ppm
Trace Impurities - Iron (Fe) ≤2.0 ppm
Trace Impurities - Lead (Pb) ≤0.300 ppm
Trace Impurities - Lithium (Li) ≤0.100 ppm
Trace Impurities - Magnesium (Mg) ≤0.20 ppm
Trace Impurities - Manganese (Mn) ≤0.100 ppm
Trace Impurities - Nickel (Ni) ≤0.200 ppm
Trace Impurities - Potassium (K) ≤1.500 ppm
Trace Impurities - Sodium (Na) ≤2.500 ppm
Trace Impurities - Strontium (Sr) ≤0.100 ppm
Trace Impurities - Titanium (Ti) ≤0.300 ppm
Trace Impurities - Zinc (Zn) ≤2.000 ppm
Particle Count at point of fill - 0.5 µm and greater
Particle Count at point of fill - 1.0 µm and greater
For additional information, go to www.askavantor.com. Search keywords
freezing" and product name."

Learn more

About VWR

Avantor is a vertically integrated, global supplier of discovery-to-delivery solutions for...

Viac About VWR